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Current Topics in Electrochemistry   Volumes    Volume 1 
Abstract
Real-time optical techniques for monitoring of etching processes
Lucila Cescato, Jaime Frejlich
Pages: 201 - 213
Number of pages: 13
Current Topics in Electrochemistry
Volume 1 

Copyright © 1992 Research Trends. All rights reserved

ABSTRACT
 
Optical interferometric techniques are pointed out as powerful tools for the monitoring of etching processes. Three different examples are described in detains to illustrate the potentiality of these techniques: the development of positive photoresist films, the electrochemical and photoelectrochemical etching of InP and the plasma etching of Si substrates. These techniques are divided into two types: reflectivity and diffraction measurement. The advantages and limitations of each technique are discussed.
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