ABSTRACT Photoacid generator (PAG) is a key compound for the cationic UV curing and crosslinking system including epoxides and vinyl ethers. One of the drawbacks of photo-acid initiating system is a narrow selection of monomer structures and light sources. Many types of PAG have low sensitivity to i-line (365 nm) light from a medium-pressure mercury lamp or UV-LED (405 nm) light applicable to conventional and environment friendly UV curing system. In this paper, recent developments of PAG that is thermally stable and highly sensitive to i-line are reviewed. Furthermore, recent developments in the application of i-line sensitive PAG in contexts of photoresists, printing technology, and biology are introduced.
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