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Current Trends in Polymer Science   Volumes    Volume 2 
Abstract
Poly(siloxyethylene glycol) as a new candidate for a functional organosilicon polymers
Hidetoshi Aoki, Yukio Nagasaki
Pages: 83 - 94
Number of pages: 12
Current Trends in Polymer Science
Volume 2 

Copyright © 1997 Research Trends. All rights reserved

ABSTRACT
 
Recently, a research and development of stimuli-responsive materials have carried out extensively for industrial materials of the next generation. It is anticipated that the stimuli-responsive polymers are applicable to an intelligent devices such as chemomechanical systems and matrixes for drug delivery systems (DDS). However, since most of the stimuli-responsive polymers have been prepared by a vinyl polymerization, the devices derived from these polymers show a restricted mobility, which has limited versatile applications of the stimuli-responsive polymers as device. To solve this problem, we have designed and synthesized a novel silicon-containing polymer; poly(siloxyethylene glycol) (PSEG), which have alternative hydrophilic oligo(ethylene glycol) (OEG) unit and hydrophobic oligo(dimethylsiloxane) (DMSO) unit in the main chain. Since PSEG consists of two very flexible components, it is anticipated to show high flexibility. As is well known, DMSO is a hydrophobic and OEG is a hydrophilic materials. Thus, PSEG homologue has alternative hydrophilic/hydrophobic units in the main chain. By changing the hydrophilic/hydrophobic balance, the characteristic of the polymer, especially the solubility in water can be controlled. For example, PSEG(2/7), where the numbers in parenthesis represent number of OEG unit and DMSO units, respectively, was soluble in cold water. With increasing temperature, the solution become turbid, which is well known as a lower critical solution temperature (LCST). The LCST can be controlled by the hydrophilic/hydrophobic balance in the main chain. Therefore, PSEG homologues are anticipated for thermo-sensitive material which shows a rapid response. The PSEGs are anticipated not only as a thermo-sensitive hydrogel but also as resist materials because of they are Si-containing polymer. Since the PSEGs show the LCST, they can be developed in water below the LCST. This is big advantage for the resist processing in lithography. In this review, synthesis and unique properties of PSEG homologues are described in detail.
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