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Trends in Physical Chemistry   Volumes    Volume 4 
Abstract
Composition, structure, and properties of AIN and AIN: H thin films formed by ion beam deposition
Ursula Mazur, K. W. Hipps
Pages: 61 - 68
Number of pages: 8
Trends in Physical Chemistry
Volume 4 

Copyright © 1994 Research Trends. All rights reserved

ABSTRACT
 
This is a review of work on ion beam deposited AIN and AIN:H films. Emphasis will be placed on single beam formation methods and the role of hydrogen in the formation and properties of both stoichiometric AIN and non-stoichiometric AIN:H. The minor components (non-AIN) in the AIN:H films produced on room temperature substrates are shown to be Al-N2, NH3 and NH3+. A frequently miss assigned band in the infrared spectrum near 2140 cm-1 is shown to be due to the N-N stretch in Al-N2. Results of isotopic substitution studies of AIN:D films will also be presented. The adhesion and atmospheric corrosion resistance of AIN and AIN:H will be contrasted. The use of AIN:H as a synthetic precursor to nano-crystalline and stoichiometric AIN will also be discussed. Infrared UV and visible light spectroscopy, SEM and STM microscopy results, and X-ray diffraction structure studies will be presented. Stoichiometry data obtained by wavelength dispersive X-ray analysis will also be given.
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